Grid-assisted co-sputtering and anode-spot-assisted sputtering: the emergence of two new deposition methods designed by KosarTech Group

Authors: Ali Kosari Mehr & Abbas Kosari Mehr

We are overjoyed to pronounce that two new, state-of-the-art PVD-based deposition methods designed by Kosari Mehrs have been officially presented and aptly described in the recently published article entitled “Grid-Assisted Co-Sputtering Method: Background, Advancement, and Prospect” in the journal of Plasma Chemistry and Plasma Processing.

For studying the complete details about grid-assisted co-sputtering and anode-spot-assisted sputtering, please visit the following webpages to gain access to the full-text:

https://rdcu.be/chabp

ResearchGate